Chemical vapor deposition of tin oxide from SnEt4

Journal De Physique. IV : JP

Volumn 9 pt 2, Issue 8, 1999, Pages

  Bertrand, N ^a   Duverneuil, P ^a   Amjoud, M ^b   Maury, F ^a  

^a CNRS   (France)

^b CADI AYYAD UNIVERSITY   (Morocco)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; CRYSTALLOGRAPHY; ELECTRIC CONDUCTIVITY; FILM GROWTH; GRAIN SIZE AND SHAPE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; REACTION KINETICS; SCANNING ELECTRON MICROSCOPY; TEMPERATURE; THICKNESS MEASUREMENT; X RAY DIFFRACTION ANALYSIS;

TETRAETHYLTIN; THICKNESS UNIFORMITY; TIN OXIDE;

TIN COMPOUNDS;

EID: 0033187952     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:1999882     Document Type: Article

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