An investigation of doping of SnO2 by ion implantation and application of ion-implanted films as gas sensors

Thin Solid Films

Volumn 279, Issue 1-2, 1996, Pages 98-105

  Rastomjee, C S ^a   Dale, R S ^a   Schaffer, R J ^a   Jones, F H ^a   Egdell, R G ^a   Georgiadis, G C ^b   Lee, M J ^b   Tate, T J ^b   Cao, L L ^c  

^a UNIVERSITY OF OXFORD   (United Kingdom)

^b IMPERIAL COLLEGE LONDON   (United Kingdom)

^c TSINGHUA UNIVERSITY   (China)

Author keywords

Ion implantation; Sensors; Tin oxide

Indexed keywords

BAND STRUCTURE; CHARACTERIZATION; CHEMICAL SENSORS; ELECTRIC RESISTANCE; ELECTRON ENERGY LEVELS; ION IMPLANTATION; PHOTOEMISSION; SEMICONDUCTING TIN COMPOUNDS; SEMICONDUCTOR DOPING; TEMPERATURE; ULTRAVIOLET SPECTROSCOPY; X RAY SPECTROSCOPY;

AUGER DEPTH PROFILING; SHEET RESISTANCE MEASUREMENTS; TIN DIOXIDE; ULTRAVIOLET PHOTOEMISSION SPECTROSCOPY; X RAY PHOTOEMISSION SPECTROSCOPY;

THIN FILMS;

EID: 0030172716     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)08156-9     Document Type: Article

References (27)

1. R.G. Egdell, in J. Nowotny (ed.), Science of Ceramic Interfaces II, Elsevier, Amsterdam, 1994, p. 527.
2. M.J. Madou and S.R. Morrison, Chemical Sensing with Solid State Devices, Academic Press, London, 1989.
3. G.S.V. Coles, K.J. Gallagher and J. Watson, Sensors Actuators, 7 (1985) 89.
4. G.S.V. Coles, S.E. Bond and G. Williams, J. Mater. Chem., 4 (1994) 23.
5. Z.M. Jarzebski and J.P. Marton, J. Electrochem. Soc., 123 (1976) 299C.
6. P.A. Cox, R.G. Egdell, C. Harding, A.F. Orchard, W.R. Patterson and P.J. Tavener, Solid State Commun., 44 (1982) 837.
7. P.A. Cox, R.G. Egdell, C. Harding, W.R. Patterson and P.J. Tavener, Surf. Sci., 123 (1982) 179.
8. R.G. Egdell, W.R. Flavell and P.J. Tavener, J. Solid State Chem., 51 (1984) 345.
9. J.F. Ziegler, J.P. Biersack and U. Littmark, The Stopping Range of Ions in Solids, Pergamon, New York, 1985.
10. C.S. Rastomjee, R.G. Egdell, M.J. Lee and T.J. Tate, Surf. Sci., 259 (1991) L769.
11. C.S. Rastomjee, R.G. Egdell, G.C. Georgiadis, M.J. Lee and T.J. Tate, J. Mater. Chem., 2 (1992) 511.
12. PROFILE CODE, Implant Sciences Corporation, Danvers, MA, 1990.
13. D. Briggs and M.P. Seah, Practical Surface Analysis, Vol. 1, Wiley, Chichester, 2nd edn., 1990.
14. T.S. Bush, C.R.A. Catlow, A.V. Chadwick, M. Cole, R.M. Geatches, G.N. Greaves and S.M. Tomlinson, J. Mater. Chem., 2 (1992) 309.
15. F.J. Berry, P.E. Holbourn and F.W.D. Woodmans, J. Chem. Soc., Dalton Trans., (1980) 2241.
16. F.J. Berry and B.J. Laundy, J. Chem. Soc., Dalton Trans., (1981) 1442.
17. C. Lau and G.K. Wertheim, J. Vac. Sci. Technol, 15 (1978) 622.
18. T.W. Capehart and S.C. Chang, J. Vac. Sci Technol., 18 (1981) 393.
19. J.M. Thomas and M.J. Tricker, J. Chem. Soc., Faraday Trans. II, 71 (1975) 325.
20. J.F. Baumard and E. Tani, J. Phys. Chem. Solids, 67 (1977) 857.
21. S. Semancik and D.F. Cox, Sensors Actuators, 12 (1987) 101.
22. D.F. Cox, T.B. Fryberger and S. Semancik, Phys. Rev. B, 38 (1988) 2072.
23. D.F. Cox, T.B. Fryberger and S. Semancik, Surf. Sci, 224 (1989) 121.
24. D.F. Cox, T.B. Fryberger and S. Semancik, Surf. Sci., 227 (1990) L105.
25. J.M. Themlin, R. Sporken, J. Darville, R. Caudano, J.M. Gilles and R.L. Johnson, Phys. Rev. B, 42 (1990) 11 914.
26. D.E. Williams and P.T. Mosely, J. Mater. Chem., 1 (1991) 809.
27. J. Robertson, Phys. Rev. B, 30 (1984) 3520.