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Volumn 43, Issue 9, 1999, Pages 1715-1724

1/f noise in polycrystalline SiGe analyzed in terms of mobility fluctuations

Author keywords

[No Author keywords available]

Indexed keywords

BORON; CARRIER MOBILITY; CHEMICAL VAPOR DEPOSITION; ELECTRON SCATTERING; GRAIN BOUNDARIES; HALL EFFECT; ION IMPLANTATION; POLYCRYSTALLINE MATERIALS; SEMICONDUCTOR DOPING; SILICA; SILICON WAFERS; SPURIOUS SIGNAL NOISE;

EID: 0033185161     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(99)00136-7     Document Type: Article
Times cited : (14)

References (25)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.