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Volumn 43, Issue 9, 1999, Pages 1715-1724
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1/f noise in polycrystalline SiGe analyzed in terms of mobility fluctuations
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Author keywords
[No Author keywords available]
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Indexed keywords
BORON;
CARRIER MOBILITY;
CHEMICAL VAPOR DEPOSITION;
ELECTRON SCATTERING;
GRAIN BOUNDARIES;
HALL EFFECT;
ION IMPLANTATION;
POLYCRYSTALLINE MATERIALS;
SEMICONDUCTOR DOPING;
SILICA;
SILICON WAFERS;
SPURIOUS SIGNAL NOISE;
HALL MOBILITY;
SILICON GERMANIDE;
SEMICONDUCTING SILICON COMPOUNDS;
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EID: 0033185161
PISSN: 00381101
EISSN: None
Source Type: Journal
DOI: 10.1016/S0038-1101(99)00136-7 Document Type: Article |
Times cited : (14)
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References (25)
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