Design considerations for the AC/DC C-MAG® deposition source and power supply system

Thin Solid Films

Volumn 351, Issue 1-2, 1999, Pages 21-26

  Wallace, Gregg ^a  

^a BOC Coating Technology   (United States)

Author keywords

Plasma processing; Sputtering

Indexed keywords

COATED MATERIALS; COATING TECHNIQUES; ELECTRIC POWER SYSTEMS; GLASS INDUSTRY; INDUSTRIAL RESEARCH; MARKETING; PLASMA APPLICATIONS;

ALTERNATING CURRENT POWER SUPPLY; PLASMA PROCESSING; PULSED DIRECT CURRENT POWER SUPPLY;

SPUTTER DEPOSITION;

EID: 0033170247     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00150-9     Document Type: Article

References (9)

1. R.J. Hill, S. Nadel, Coated Glass Applications and Markets, BOC, Fairfield, CA, 1998.
2. R.J. Hill, J. Non-Cryst. Solids 218 (1997) 54.
3. R.J. Hill, F. Jansen, J. Non-Cryst. Solids 218 (1997) 35.
4. R. Terry, US patent applied for 1998.
5. H.E. McKelvey, Magnetron cathode sputtering apparatus, US patent 4,356,073 (Oct. 1982).
6. M.G. Robinson, Magnetron cathode sputtering apparatus, US patent 4,394,236 (July 1983).
7. H.E. McKelvey, Cathodic sputtering apparatus, US patent 4,443,318 (Apr. 1984).
8. H.E. McKelvey, Rotatable sputtering apparatus, US patent 4,445,997 (May. 1984).
9. H.E. McKelvey, Magnetron cathode sputtering apparatus, US patent 4,466,877 (Aug. 1984).