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Volumn 218, Issue , 1997, Pages 54-57

Reactive sputtering and the use of anodes for optical coatings

Author keywords

[No Author keywords available]

Indexed keywords

ANODES; CERAMIC MATERIALS; CONDUCTIVE FILMS; ELECTRIC CURRENTS; MAGNETRON SPUTTERING;

EID: 0031549332     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(97)00132-4     Document Type: Article
Times cited : (7)

References (27)
  • 4
    • 0040806127 scopus 로고
    • All oxide broad band antireflection coatings by reactive sputter deposition
    • S.C. Shulz, 'All oxide broad band antireflection coatings by reactive sputter deposition', in: 34th Ann. Tech. Conf. Proc. Soc. Vac. Coaters (1993) 229.
    • (1993) 34th Ann. Tech. Conf. Proc. Soc. Vac. Coaters , pp. 229
    • Shulz, S.C.1
  • 5
    • 0042449220 scopus 로고
    • Planar magnetron sputtering
    • ed. J.L. Vossen and W. Kern Academic Press, Orlando, FL
    • R.K. Waits, 'Planar magnetron sputtering', in: Thin Film Processes, Vol. 1, ed. J.L. Vossen and W. Kern (Academic Press, Orlando, FL, 1978).
    • (1978) Thin Film Processes , vol.1
    • Waits, R.K.1
  • 9
    • 0027846158 scopus 로고
    • Utilization of silicon targets for reactive sputtering from a rotating cylindrical dc magnetron cathode
    • J. Hillendahl, R. Newcomb, 'Utilization of silicon targets for reactive sputtering from a rotating cylindrical dc magnetron cathode', in: 36th Ann. Tech. Conf. Proc. Soc. Vac. Coaters (1993) 491.
    • (1993) 36th Ann. Tech. Conf. Proc. Soc. Vac. Coaters , pp. 491
    • Hillendahl, J.1    Newcomb, R.2
  • 19
    • 0028577122 scopus 로고
    • Effect of anode location on deposition profiles for long rotatable magnetrons
    • P. Sieck, 'Effect of anode location on deposition profiles for long rotatable magnetrons', in: 37th Ann. Tech. Conf. Proc. Soc. Vac. Coaters (1994) p. 233.
    • (1994) 37th Ann. Tech. Conf. Proc. Soc. Vac. Coaters , pp. 233
    • Sieck, P.1
  • 20
    • 0029428893 scopus 로고
    • Distribution of sputtered films from a C-mag® cylindrical source
    • P. Sieck, 'Distribution of sputtered films from a C-Mag® cylindrical source', in: 38th Ann. Tech. Conf. Proc. Soc. Vac. Coaters (1995) p. 281.
    • (1995) 38th Ann. Tech. Conf. Proc. Soc. Vac. Coaters , pp. 281
    • Sieck, P.1
  • 22
    • 0039027816 scopus 로고    scopus 로고
    • Patent applied for
    • Patent applied for.
  • 23
    • 0039620032 scopus 로고
    • Two approaches to conductive coatings for the display market
    • San Jose, CA
    • K.P. Gibbons et al., 'Two approaches to conductive coatings for the display market', in: Proc. Display Works 95, San Jose, CA, 1995.
    • (1995) Proc. Display Works 95
    • Gibbons, K.P.1
  • 24
    • 0029431014 scopus 로고
    • Anti-static anti-reflection coatings using various metal layers
    • J. Wolfe, 'Anti-static anti-reflection coatings using various metal layers', in: 38th Ann. Tech. Conf. Proc. Soc. Vac. Coaters (1995) p. 271.
    • (1995) 38th Ann. Tech. Conf. Proc. Soc. Vac. Coaters , pp. 271
    • Wolfe, J.1
  • 25
    • 0040806133 scopus 로고    scopus 로고
    • Patent applied for
    • Patent applied for.
  • 27
    • 0042449220 scopus 로고
    • ed. J.L. Vossen and W. Kem Academic Press, Orlando, FL
    • R.K. Waits, in: Thin Film Processes, Vol. 1, ed. J.L. Vossen and W. Kem (Academic Press, Orlando, FL, 1978) p. 150.
    • (1978) Thin Film Processes , vol.1 , pp. 150
    • Waits, R.K.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.