-
4
-
-
0040806127
-
All oxide broad band antireflection coatings by reactive sputter deposition
-
S.C. Shulz, 'All oxide broad band antireflection coatings by reactive sputter deposition', in: 34th Ann. Tech. Conf. Proc. Soc. Vac. Coaters (1993) 229.
-
(1993)
34th Ann. Tech. Conf. Proc. Soc. Vac. Coaters
, pp. 229
-
-
Shulz, S.C.1
-
5
-
-
0042449220
-
Planar magnetron sputtering
-
ed. J.L. Vossen and W. Kern Academic Press, Orlando, FL
-
R.K. Waits, 'Planar magnetron sputtering', in: Thin Film Processes, Vol. 1, ed. J.L. Vossen and W. Kern (Academic Press, Orlando, FL, 1978).
-
(1978)
Thin Film Processes
, vol.1
-
-
Waits, R.K.1
-
9
-
-
0027846158
-
Utilization of silicon targets for reactive sputtering from a rotating cylindrical dc magnetron cathode
-
J. Hillendahl, R. Newcomb, 'Utilization of silicon targets for reactive sputtering from a rotating cylindrical dc magnetron cathode', in: 36th Ann. Tech. Conf. Proc. Soc. Vac. Coaters (1993) 491.
-
(1993)
36th Ann. Tech. Conf. Proc. Soc. Vac. Coaters
, pp. 491
-
-
Hillendahl, J.1
Newcomb, R.2
-
12
-
-
0040806129
-
-
US patent #5,106,474
-
E.R. Dickey, E.J. Bjornard, J.J. Hoffman, 'Anode structures for magnetron sputtering apparatus', US patent #5,106,474.
-
Anode Structures for Magnetron Sputtering Apparatus
-
-
Dickey, E.R.1
Bjornard, E.J.2
Hoffman, J.J.3
-
19
-
-
0028577122
-
Effect of anode location on deposition profiles for long rotatable magnetrons
-
P. Sieck, 'Effect of anode location on deposition profiles for long rotatable magnetrons', in: 37th Ann. Tech. Conf. Proc. Soc. Vac. Coaters (1994) p. 233.
-
(1994)
37th Ann. Tech. Conf. Proc. Soc. Vac. Coaters
, pp. 233
-
-
Sieck, P.1
-
20
-
-
0029428893
-
Distribution of sputtered films from a C-mag® cylindrical source
-
P. Sieck, 'Distribution of sputtered films from a C-Mag® cylindrical source', in: 38th Ann. Tech. Conf. Proc. Soc. Vac. Coaters (1995) p. 281.
-
(1995)
38th Ann. Tech. Conf. Proc. Soc. Vac. Coaters
, pp. 281
-
-
Sieck, P.1
-
21
-
-
0039620030
-
-
US patent #5,487,821
-
P. Sieck, R.J. Hill, J. Vossen, S. Schulz, 'Anode structure for magnetron sputtering systems', US patent #5,487,821.
-
Anode Structure for Magnetron Sputtering Systems
-
-
Sieck, P.1
Hill, R.J.2
Vossen, J.3
Schulz, S.4
-
22
-
-
0039027816
-
-
Patent applied for
-
Patent applied for.
-
-
-
-
23
-
-
0039620032
-
Two approaches to conductive coatings for the display market
-
San Jose, CA
-
K.P. Gibbons et al., 'Two approaches to conductive coatings for the display market', in: Proc. Display Works 95, San Jose, CA, 1995.
-
(1995)
Proc. Display Works 95
-
-
Gibbons, K.P.1
-
24
-
-
0029431014
-
Anti-static anti-reflection coatings using various metal layers
-
J. Wolfe, 'Anti-static anti-reflection coatings using various metal layers', in: 38th Ann. Tech. Conf. Proc. Soc. Vac. Coaters (1995) p. 271.
-
(1995)
38th Ann. Tech. Conf. Proc. Soc. Vac. Coaters
, pp. 271
-
-
Wolfe, J.1
-
25
-
-
0040806133
-
-
Patent applied for
-
Patent applied for.
-
-
-
-
27
-
-
0042449220
-
-
ed. J.L. Vossen and W. Kem Academic Press, Orlando, FL
-
R.K. Waits, in: Thin Film Processes, Vol. 1, ed. J.L. Vossen and W. Kem (Academic Press, Orlando, FL, 1978) p. 150.
-
(1978)
Thin Film Processes
, vol.1
, pp. 150
-
-
Waits, R.K.1
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