Cylindrical DC magnetron sputtering assisted by microwave plasma

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 7 B, 1999, Pages 4326-4328

  Yonesu, Akira ^a   Kato, Takashi ^a   Takemoto, Hiroki ^a   Nishimura, Naoki ^a   Yamashiro, Yasumasa ^a  

^a UNIVERSITY OF THE RYUKYUS   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ELECTRIC DISCHARGES; MAGNETIC FIELDS; MAGNETRONS; MICROWAVES; PERMANENT MAGNETS; PLASMAS; SPUTTER DEPOSITION; THIN FILMS;

ALUMINUM FILMS; CYLINDRICAL MULTIPOLAR MAGNETRON ARRANGEMENT; MAGNETRON DISCHARGE; MICROWAVE PLASMA;

MAGNETRON SPUTTERING;

EID: 0033157872     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.4326     Document Type: Article

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