Influence of target shape on properties of AlN sputtered film

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 9 PART B, 1998, Pages 5224-5226

  Tominaga, Kikuo ^a   Sato, Yoshifumi ^a   Mori, Ichiro ^a   Kusaka, Kazuya ^a   Hanabusa, Takao ^a  

^a UNIVERSITY OF TOKUSHIMA   (Japan)

Author keywords

AlN film; Planar magnetron sputtering; Target shape

Indexed keywords

CRYSTAL DEFECTS; CRYSTAL ORIENTATION; GRAIN GROWTH; ION BOMBARDMENT; MAGNETIC FIELD EFFECTS; MAGNETRON SPUTTERING; NITRIDES; SPUTTER DEPOSITION;

ALUMINUM NITRIDE FILM; TARGET SHAPE;

FILM GROWTH;

EID: 0032155454     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.5224     Document Type: Article

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