Analysis of thin film stress measurement techniques

Thin Solid Films

Volumn 301, Issue 1-2, 1997, Pages 45-54

  Malhotra, S G ^a,c,d   Rek, Z U ^b   Yalisove, S M ^a   Bilello, J C ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

^b SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

^c Semiconduct R and D Center ^*  (United States)

^d IBM   (United States)

Author keywords

Depth profiling; Molybdenum; Stress; X ray diffraction

Indexed keywords

CRYSTAL MICROSTRUCTURE; MAGNETRON SPUTTERING; METALLIC FILMS; MOLYBDENUM; STRESSES; X RAY DIFFRACTION ANALYSIS;

DEPTH PROFILING; FILM STRESSES; HIGH RESOLUTION X RAY DIFFRACTION;

THIN FILMS;

EID: 0031153333     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09569-7     Document Type: Article

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