Laser-induced desorption from STM-selected semiconductor sites

Progress in Surface Science

Volumn 61, Issue 1, 1999, Pages 1-19

  Itoh, Noriaki ^a   Kanasaki, Jun'Ichi ^b   Xu, Jun ^c  

^a OSAKA INSTITUTE OF TECHNOLOGY   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

^c OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; DESORPTION; ELECTRON ENERGY LEVELS; LASER BEAMS; SEMICONDUCTING SILICON; SURFACE STRUCTURE; SURFACE TREATMENT;

BOND SCISSION; ELECTRONIC EXCITATION; LASER INDUCED DESORPTION;

SCANNING ELECTRON MICROSCOPY;

EID: 0033133322     PISSN: 00796816     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0079-6816(99)00007-6     Document Type: Review

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