Evaluation of second generation DUV resists for advanced microprocessors

Microelectronic Engineering

Volumn 41-42, Issue , 1998, Pages 307-310

  Maltabes, J G ^a   Yuan, C ^a   Fu, C C ^a   Sturtevant, J S ^a   Blackley, S ^a   Pressley, L ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DESIGN; LITHOGRAPHY; MICROPROCESSOR CHIPS; SEMICONDUCTOR DEVICE MANUFACTURE;

ADVANCED MICROPROCESSORS;

PHOTORESISTS;

EID: 0031702332     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(98)00070-7     Document Type: Article

References (8)