SCOPUS 정보 검색 플랫폼

Volumn 41-42, Issue , 1998, Pages 315-318

Evaluation of DNQ/novolac resists for 130 nm device maskmaking

Author keywords

[No Author keywords available]

Indexed keywords

CHEMISTRY; DESIGN; ELECTRON BEAMS; MASKS; NANOTECHNOLOGY; PERFORMANCE;

MASKMAKING;

PHOTORESISTS;

EID: 12844273081 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/S0167-9317(98)00072-0 Document Type: Article

Times cited : (2)

References (5)

1
- 0015727816
- L.F. Thompson, M.J. Bowden, J. Electrochem. Soc., 120, 1722(1973).
- (1973) J. Electrochem. Soc. , vol.120 , pp. 1722
- Thompson, L.F.¹ Bowden, M.J.²

2
- 0001361763
- Z.C.H. Tan, T. Stivers, H. Lern, N. DiGiacomo, and D. Wood, J. Vac. Sci. Technol., B 13(6), 2539(1995).
- (1995) J. Vac. Sci. Technol., B , vol.13 , Issue.6 , pp. 2539
- Tan, Z.C.H.¹ Stivers, T.² Lern, H.³ Digiacomo, N.⁴ Wood, D.⁵

3
- 0029215169
- M. Gesley, T. Mulera, C. Nurmi, J. Radley, A. Sagle, K. Standiford, Z. Tan, J. Thomas, and L. Veneklasen, SPIE Proceedings, 2437, 168 (1995).
- (1995) SPIE Proceedings , vol.2437 , pp. 168
- Gesley, M.¹ Mulera, T.² Nurmi, C.³ Radley, J.⁴ Sagle, A.⁵ Standiford, K.⁶ Tan, Z.⁷ Thomas, J.⁸ Veneklasen, L.⁹

4
- 0029545517
- C. Sauer, R. Dean, E. Morita, Z. Tan, B. Smith, D. Ewbank, S. Duttagupta, A. Rudak, SPIE Proceedings, 2621, 52(1995).
- (1995) SPIE Proceedings , vol.2621 , pp. 52
- Sauer, C.¹ Dean, R.² Morita, E.³ Tan, Z.⁴ Smith, B.⁵ Ewbank, D.⁶ Duttagupta, S.⁷ Rudak, A.⁸

5
- 12844289288
- to be published
- C. Constantine, DJ. Johnson. R.J. Westerman, T. Coleman, and T. Faure, Photomask Japan '97 (to be published).
- Photomask Japan '97
- Constantine, C.¹ Johnson, D.J.² Westerman, R.J.³ Coleman, T.⁴ Faure, T.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.