Micromachined Si3N4-tip on cantilever for parallel SFM and NSOM applications

Microelectronic Engineering

Volumn 46, Issue 1, 1999, Pages 427-430

  Jung, M Y ^a   Choi, S S ^b   Lyo, I W ^a  

^a Yonsei University   (South Korea)

^b SunMoon University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; MICROMACHINING; OPTICAL FIBERS; OPTICAL MICROSCOPY; PHOTORESISTS; REACTIVE ION ETCHING; SEMICONDUCTING SILICON;

NEAR FIELD SCANNING OPTICAL MICROSCOPY (NSOM); SCANNING FORCE MICROSCOPY (SFM);

MICROELECTRONIC PROCESSING;

EID: 0033132082     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00125-2     Document Type: Article

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