Progress in the development of extreme ultraviolet lithography exposure systems

Microelectronic Engineering

Volumn 46, Issue 1, 1999, Pages 19-22

  Stulen, Richard H ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAMERAS; INTEGRATED CIRCUIT LAYOUT; LASER PRODUCED PLASMAS; LIGHT REFLECTION; MASKS; OPTICAL COATINGS; SILICON WAFERS; SYNCHROTRONS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0033132079     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00007-6     Document Type: Article

References (8)

1. 1 C. W. Gwyn, R. H. Stulen, D. W. Sweeney, and D. T. Attwood, "Extreme Ultraviolet Lithography," J. Vac. Sci Techn. B 16 (1998).
2. 2 C. Montcalm, S. Bajt, P.B. Mirkarimi, E. Spiller, F.J. Weber, and J.A. Folta, "Multilayer Reflective Coatings for Extreme Ultraviolet Lithography," p 42 in Y.Vladimirsky, Emerging Lithography Techologies II,SPIE 3331.
3. 2 C. Montcalm, S. Bajt, P.B. Mirkarimi, E. Spiller, F.J. Weber, and J.A. Folta, "Multilayer Reflective Coatings for Extreme Ultraviolet Lithography," p 42 in Y.Vladimirsky, Emerging Lithography Techologies II,SPIE 3331.
4. 3 H. Kinoshita, K. Kurihara, Y. Ishii, and Y. Torii, "Soft X-Ray Reduction Lithography Using Multilayer Mirrors," J. Vac. Sci. Technol. B7, 1648 (1989).
5. 4 G. D. Kubiak, L.J. Bernardez, and K. Krenz, "High-Power Extreme Ultraviolet Source Based on Gas Jets," p.81 in Y. Vladimirsky, op.cit.
6. 4 G. D. Kubiak, L.J. Bernardez, and K. Krenz, "High-Power Extreme Ultraviolet Source Based on Gas Jets," p.81 in Y. Vladimirsky, op.cit.
7. 5 D. W. Sweeney, R. Hudyma, H.N. Chapman, and D. Schafer, "EUV Optical design for a 100nm CD Imaging System," p. 2 in Y Vladimirsky, op. cit.
8. 5 D. W. Sweeney, R. Hudyma, H.N. Chapman, and D. Schafer, "EUV Optical design for a 100nm CD Imaging System," p. 2 in Y Vladimirsky, op. cit.