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Volumn 38, Issue 3, 1999, Pages 950-957

Pore structure modification of alumina support by SiC-Si3N4 nanoparticles prepared by the particle precipitation aided chemical vapor deposition

Author keywords

[No Author keywords available]

Indexed keywords

ACETYLENE; ALUMINA; CHEMICAL MODIFICATION; CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; MECHANICAL PERMEABILITY; NANOSTRUCTURED MATERIALS; POROSITY; PRECIPITATION (CHEMICAL); SILANES; SILICON CARBIDE; SILICON NITRIDE;

EID: 0033103816     PISSN: 08885885     EISSN: None     Source Type: Journal    
DOI: 10.1021/ie9805990     Document Type: Article
Times cited : (8)

References (14)
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    • (1989) Solid State Ionics , vol.32-33 , pp. 771
    • Burggraaf, A.J.1    Keizer, K.2    Van Hassel, B.A.3
  • 2
    • 0001044481 scopus 로고
    • Preparation of alumina thin membrane by sol-gel processing and its characterization by gas permeation
    • Okubo, M.; Watanabe, M.; Kusakabe, K.; Morooka, S. Preparation of alumina thin membrane by sol-gel processing and its characterization by gas permeation. J. Mater. Sci. 1990, 25, 4822.
    • (1990) J. Mater. Sci. , vol.25 , pp. 4822
    • Okubo, M.1    Watanabe, M.2    Kusakabe, K.3    Morooka, S.4
  • 3
    • 0028519522 scopus 로고
    • Current hurdles to the success of high-temperature membrane reactors
    • Saracco, G.; Specchia, V.; Swaaij, W. P. M. Current Hurdles to the Success of High-Temperature Membrane Reactors. J. Membr. Sci. 1994, 95, 105.
    • (1994) J. Membr. Sci. , vol.95 , pp. 105
    • Saracco, G.1    Specchia, V.2    Swaaij, W.P.M.3
  • 4
    • 0028433810 scopus 로고
    • Catalytic inorganic membrane reactors: Present experience and future opportunities
    • Saracco, G.; Specchia, V. Catalytic Inorganic Membrane Reactors: Present Experience and Future Opportunities. Catal. Rev. Sci. Eng. 1994, 36, 305.
    • (1994) Catal. Rev. Sci. Eng. , vol.36 , pp. 305
    • Saracco, G.1    Specchia, V.2
  • 6
    • 0024621292 scopus 로고
    • Introduction of specific gas selectivity to porous glass membranes by treatment with tetraethoxysilane
    • Okubo, T.; Inoue, H. Introduction of Specific Gas Selectivity to Porous Glass Membranes by Treatment with Tetraethoxysilane. J. Membr. Sci. 1989, 42, 109.
    • (1989) J. Membr. Sci. , vol.42 , pp. 109
    • Okubo, T.1    Inoue, H.2
  • 8
    • 0026833136 scopus 로고
    • CVD of solid oxides in porous substrates for ceramic membranes modification
    • Lin, Y. S.;. Burggraaf, A. J. CVD of Solid Oxides in Porous Substrates for Ceramic Membranes Modification. AIChE J. 1992, 35, 445.
    • (1992) AIChE J. , vol.35 , pp. 445
    • Lin, Y.S.1    Burggraaf, A.J.2
  • 9
    • 0026940653 scopus 로고
    • Preparation of silicon dioxide films by low-pressure chemical vapor deposition and porous alumina substrates
    • Megiris, C. E.; Glezer, J. H. E. Preparation of Silicon Dioxide Films by Low-Pressure Chemical Vapor Deposition and Porous Alumina Substrates. Chem. Eng. Sci. 1992, 47, 3925.
    • (1992) Chem. Eng. Sci. , vol.47 , pp. 3925
    • Megiris, C.E.1    Glezer, J.H.E.2
  • 10
    • 0027579796 scopus 로고
    • Experimental studies on pore size change of porous ceramic membranes after modification
    • Lin, Y.; Burggraaf, A. J. Experimental Studies on Pore Size Change of Porous Ceramic Membranes after Modification. J. Membr. Sci. 1993, 79, 65.
    • (1993) J. Membr. Sci. , vol.79 , pp. 65
    • Lin, Y.1    Burggraaf, A.J.2
  • 11
    • 0022144690 scopus 로고
    • Rapid growth of A1N films by particle precipitation aided chemical vapor deposition
    • Komiyama, H.; Osawa, T. Rapid Growth of A1N Films by Particle Precipitation Aided Chemical vapor Deposition. Jpn. J. Appl. Phys. 1985, 24, L795.
    • (1985) Jpn. J. Appl. Phys. , vol.24
    • Komiyama, H.1    Osawa, T.2
  • 13
    • 0030149473 scopus 로고    scopus 로고
    • Using simultaneous deposition and rapid growth to produce nanostructured composited films of A1N/TiN by chemical vapor deposition
    • Liu, Y. J.; Kim, H. J.; Egashira, Y.; Kimura, H.; Komiyama, H. Using Simultaneous Deposition and Rapid Growth to Produce Nanostructured Composited Films of A1N/TiN by Chemical Vapor Deposition. J. Am. Ceram. Soc. 1996, 79, 1335.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.