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Volumn 28, Issue 2, 1999, Pages 98-104

Gas Source Molecular Beam Epitaxy Grown Strained-Si Films on Step-Graded Relaxed Si1-xGex for MOS Applications

Author keywords

Band offset; Gas source molecular beam epitaxy (GSMBE); Heterostructure MOSFET; Silicon germanium; Strained Si

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELLIPSOMETRY; FILM GROWTH; HETEROJUNCTIONS; MOLECULAR BEAM EPITAXY; MOSFET DEVICES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING SILICON COMPOUNDS; THRESHOLD VOLTAGE;

EID: 0033078541     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-999-0225-5     Document Type: Article
Times cited : (5)

References (37)
  • 36
    • 0347344082 scopus 로고
    • PhD. thesis, Stanford University
    • J.J Welser, PhD. thesis, Stanford University, (1994).
    • (1994)
    • Welser, J.J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.