A kinetic study of chemical vapor deposition of AlN/TiN composite film

Kagaku Kogaku Ronbunshu

Volumn 22, Issue 6, 1996, Pages 1429-1434

  Liu, Yi Jun ^a   Osawa, Toshio ^a   Egashira, Yasuyuki ^a   Komiyama, Hiroshi ^a   Kim, Hee Joon ^b  

^a UNIVERSITY OF TOKYO   (Japan)

^b TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

AlN TiN composite film; APCVD; Deposition mechanism; Diffusion coefficient; Growth species

Indexed keywords

ALUMINUM; ALUMINUM CHLORIDE; ALUMINUM COATINGS; ALUMINUM NITRIDE; ATMOSPHERIC PRESSURE; CHLORINE COMPOUNDS; COMPOSITE FILMS; DEPOSITION; DIFFUSION; FILM GROWTH; GASES; KINETIC THEORY; NANOCOMPOSITE FILMS; ROTATING DISKS; TITANIUM; TITANIUM COMPOUNDS; TITANIUM NITRIDE; VAPOR DEPOSITION;

ALN; APCVD; ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION; CHEMICAL VAPOR DEPOSITIONS (CVD); DEPOSITION MECHANISM; GROWTH SPECIES; NANOSTRUCTURED COMPOSITES; SINGLE COMPONENTS;

CHEMICAL VAPOR DEPOSITION;

EID: 0346555082     PISSN: 0386216X     EISSN: 13499203     Source Type: Journal    
DOI: 10.1252/kakoronbunshu.22.1429     Document Type: Article

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