Photoselective metal deposition on amorphous silicon p-i-n solar cells

Journal of the Electrochemical Society

Volumn 144, Issue 10, 1997, Pages

  Kooij, E S ^a   Hamoumi, M ^a   Kelly, J J ^a   Schropp, R E I ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANNEALING; CHARGE CARRIERS; DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRIC FIELD EFFECTS; ELECTRIC RESISTANCE; GOLD; METALLIZING; NICKEL; OHMIC CONTACTS; PHOTOVOLTAIC EFFECTS;

PHOTOCATHODIC DEPOSITION;

SILICON SOLAR CELLS;

EID: 0031246736     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838005     Document Type: Article

References (4)

1. J. J. Kelly, J. M. G. Rikken, J. W. M. Jacobs, and A. Valster, J. Vac. Sci. Technol. B, 6, 48 (1988).
2. S. R. Morrison, Electrochemistry at Semiconductor ana Oxidized Metal Electrodes, Plenum, New York (1980).
3. D. E. Carlson and C. R. Wronski, Appl. Phys. Lett., 28, 671 (1976).
4. E. C. Wurst and E. H. Borneman, J. Appl. Phys., 28, 235 (1957).