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Volumn 32, Issue 4, 1999, Pages 1119-1127

Frustrated Coalescence in a Chemically Reactive Polymer Blend Film

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COALESCENCE; COPOLYMERS; ELECTROMAGNETIC WAVE REFLECTION; ESTERIFICATION; INTERFACES (MATERIALS); MORPHOLOGY; NEUTRON REFLECTION; OPTICAL MICROSCOPY; PHASE SEPARATION; POLYMER BLENDS; THERMAL EFFECTS;

EID: 0033075172     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma980296h     Document Type: Article
Times cited : (17)

References (86)
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    • Changes in roughness at the two (asymmetric) interfaces can be distinguished by the fact that increase of roughness at the air boundary causes more of a damping of oscillations while that at the silicon surface causes a rapid drop in the asymptotic value of the reflectivity. (After the first annealing, the oscillations amplitude in Figure 4 are less damped but nevertheless accompanied by a decrease in the asymptotic value of the reflectivity. The transient reduction in damping can be attributed to a coincidental quantitative matching of roughness at the two interfaces.)


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