SCOPUS 정보 검색 플랫폼

Volumn 389, Issue 1-3, 1997, Pages 29-47

Dynamics of surface reactions induced by low-energy electrons oxidation of hydrogen-passivated Si by H2O

(3) Klyachko, D V a Rowntree, P b Sanche, L a

Author keywords

Activated surface chemical reactions; Dissociative electron attachment; Excited states; Hydrogen terminated silicon; Low energy electrons; Water; X ray photoelectron spectroscopy

Indexed keywords

ELECTRON ENERGY LEVELS; ELECTRON TRANSITIONS; HYDROGEN; MATHEMATICAL MODELS; MOLECULAR DYNAMICS; OXIDATION; PASSIVATION; REACTION KINETICS; SUBSTRATES; SURFACE PHENOMENA; WATER; X RAY PHOTOELECTRON SPECTROSCOPY;

DISSOCIATIVE ELECTRON ATTACHMENT;

SEMICONDUCTING SILICON;

EID: 0031556586 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(97)00354-3 Document Type: Article

Times cited : (26)

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