On the a-Si:H film growth: The role of the powder formation

Journal of Non-Crystalline Solids

Volumn 198-200, Issue PART 2, 1996, Pages 1207-1211

  Macarico A ^a   Vieira, M ^a   Fantoni, A ^a   Louro, P ^a   Seco A ^a   Martins, R ^a   Hollenstein, C ^b  

^a UNINOVA   (Portugal)

^b EPFL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; CHEMISTRY; DECOMPOSITION; DENSITY (OPTICAL); DENSITY (SPECIFIC GRAVITY); HYDROGENATION; MORPHOLOGY; PLASMA APPLICATIONS; POWDERS; SILANES; STRUCTURE (COMPOSITION);

CONTINUOUS WAVE FREQUENCY; INHOMOGENEOUS FILMS; MODULATED WAVE FREQUENCY; OPTOELECTRONIC PROPERTIES; POWDER FORMATION;

FILM GROWTH;

EID: 18344400044     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/0022-3093(96)00181-0     Document Type: Article

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