LEED, AES, and STM study of an ideal Si(111)-(1 × 1):H surface prepared by in situ atomic hydrogen exposure of the Pb induced (√3 ×√3)R30°-β phase: First experimental evidence of a non reversible transformation

Applied Surface Science

Volumn 137, Issue 1-3, 1999, Pages 71-77

  Odasso, S ^a,c   Seehofer, L ^b   Johnson, R L ^b  

^a CNRS   (France)

^b UNIVERSITY OF HAMBURG   (Germany)

^c NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Si(111) (1 1):H; STM; Volmer Weber type

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CONDENSATION; FILM GROWTH; GAS ADSORPTION; HYDROGEN; LEAD; LOW ENERGY ELECTRON DIFFRACTION; METALLIC FILMS; PASSIVATION; SCANNING TUNNELING MICROSCOPY; SURFACE CHEMISTRY; SURFACE TOPOGRAPHY;

ADSORBATES; NONREVERSIBLE TRANSFORMATIONS;

SILICON WAFERS;

EID: 0032761688     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00368-7     Document Type: Article

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