Influence of film thickness on the molecular arrangement of copper phthalocyanine on hydrogen-terminated Si(111)

Applied Surface Science

Volumn 113-114, Issue , 1997, Pages 316-321

  Nakamura, Masakazu ^a,b   Morita, Yukinori ^a,c   Tokumoto, Hiroshi ^a,c  

^a JT RES CENTER FOR ATOM TECHNOLOGY   (Japan)

^b NATL INST FOR ADV INTERDISC RES   (Japan)

^c ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER COMPOUNDS; CRYSTAL GROWTH; CRYSTAL LATTICES; HYDROGEN; MOLECULAR BEAM EPITAXY; MOLECULAR CRYSTALS; MOLECULES; MONOLAYERS; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING SILICON;

COPPER PHTHALOCYANINE; MOLECULAR ARRANGEMENT;

THIN FILMS;

EID: 4243722839     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00949-X     Document Type: Article

References (10)

1. H. Wohltjen, W.R. Barger, A.W. Snow and N.L. Jarvis, IEEE Trans. Electron Devices 32 (1985) 1170.
2. R.O. Loutfy, J.H. Sharp, C.K. Hsiao and R. Ho, J. Appl. Phys. 52 (1981) 5218.
3. C.W. Tang, Appl. Phys. Lett. 48 (1986) 183.
4. G. Dufour, C. Poncey, F. Rochet, H. Roulet, M. Sacchi, M. De Santis and M. De Crescenzi, Surf. Sci. 319 (1994) 251.
5. H. Tada, T. Kawaguchi and A. Koma, Appl. Surf. Sci. 75 (1994) 93.
6. T. Nonaka, Y. Nakagawa, Y. Mori, M. Hirai, T. Matsunobe, M. Nakamura, T. Takahagi and A. Ishitani, Thin Solid Films 256 (1995) 262.
7. M. Nakamura, Y. Morita, Y. Mori, A. Ishitani and H. Tokumoto, J. Vac. Sci. Technol. B 14 (1996) 1109.
8. A. Karen, M. Nakamura and A. Ishitani, in: Secondary Ion Mass Spectrometry, SIMS X (Wiley, New York), to be published.
9. C. Ludwig, R. Strohmaier, J. Petersen, B. Gompf and W. Eisenmenger, J. Vac. Sci. Technol. B 12 (1994) 1963.
10. For example: G.E. Collins, K.W. Nebesny, C.D. England, L.-K. Chau, P.A. Lee, B.A. Parkinson and N.R. Armstrong, J. Vac. Sci. Technol. A 10 (1992) 2902.