IR laser photosensitized decomposition of trimethyl(2-propynyloxy)silane for chemical vapour deposition of polydimethylsiloxane phases

Journal of Analytical and Applied Pyrolysis

Volumn 44, Issue 2, 1998, Pages 219-226

  Urbanová, Markéta ^a   Morita, Hiroshi ^b   Dřínek, Vladislav ^a   Bastl, Zdeněk ^c   Šubrt, Jan ^d   Pola, Josef ^a  

^a INSTITUTE OF CHEMICAL PROCESS FUNDAMENTALS   (Czech Republic)

^b CHIBA UNIVERSITY   (Japan)

^c J HEYROVSKÝ INSTITUTE OF PHYSICAL CHEMISTRY   (Czech Republic)

^d INSTITUTE OF INORGANIC CHEMISTRY   (Czech Republic)

Author keywords

Chemical vapour deposition; Laser induced decomposition; Pyrolysis; Si C H O films; Trimethyl(2 propynyloxy)silane

Indexed keywords

CARBON DIOXIDE LASERS; CHEMICAL VAPOR DEPOSITION; FILMS; HYDROCARBONS; LASER APPLICATIONS; ORGANIC POLYMERS; PHOTOLYSIS; SILICON COMPOUNDS;

INFRARED LASERS; LASER INDUCED DECOMPOSITION; PHOTOSENSITIZE; POLYDIMETHYL SILOXANE; SILICON OXYCARBIDE; TRIMETHYLPROPYNYLOXYSILANE; ULTRAVIOLET LASERS;

PYROLYSIS;

EID: 0031678319     PISSN: 01652370     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0165-2370(97)00082-X     Document Type: Article

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