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Volumn 67, Issue , 1999, Pages 199-204
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Properties of poly-Si obtained by Solid Phase Crystallization of differently produced a-Si:H thin films
a a a a a a a a a
a
ENEA CR Portici
(Italy)
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS FILMS;
AMORPHOUS SILICON;
ANNEALING;
CRYSTALLIZATION;
FUSED SILICA;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
POLYCRYSTALLINE MATERIALS;
SEMICONDUCTING FILMS;
SUBSTRATES;
POLYSILICON THIN FILMS;
SOLID PHASE CRYSTALLIZATION;
SEMICONDUCTING SILICON;
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EID: 0032688477
PISSN: 10120394
EISSN: None
Source Type: Conference Proceeding
DOI: 10.4028/www.scientific.net/ssp.67-68.199 Document Type: Article |
Times cited : (5)
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References (18)
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