Simultaneous measurement of size and depth of each defect in a silicon wafer using light scattering at two wavelengths: Principle, limitation and applications of optical shallow defect analyzer

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 6 A, 1999, Pages 3776-3783

  Takeda, Kazuo ^a   Isomae, Seiichi ^a   Ohkura, Makoto ^a   Maeshima, Muneo ^a   Matsui, Shigeru ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL DEFECTS; CRYSTAL GROWTH FROM MELT; CRYSTAL MICROSTRUCTURE; EPITAXIAL GROWTH; LIGHT SCATTERING; THERMOOXIDATION;

CRYSTAL ORIGINATED PARTICLES (COP); OPTICAL SHALLOW DEFECT ANALYZER (OSDA);

SILICON WAFERS;

EID: 0032688356     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.3776     Document Type: Article

References (18)

1. K. Takeda, H. Ishida and A. Hiraiwa: Ext. Abstr. Solid State Device and Materials, 1996, Yokohama (Business Center for Academic Societies Japan, Tokyo, 1996) p. 151.
2. K. Takeda, H. Ishida and A. Hiraiwa: Mater. Res. Soc. Symp. Proc. 442 (1997) 37.
3. T. Ogawa and N. Nango: Rev. Sci. Instrum. 57 (1986) 1135.
4. K. Moriya: J. Cryst. Growth 94 (1989) 182.
5. J. Ryuta, E. Morita, T. Tanaka and Y. Shimanuki: Jpn. J. Appl. Phys. 29 (1990) L1947.
6. J. Ryuta, E. Morita, T. Tanaka and Y. Shimanuki: Jpn. J. Appl. Phys. 31 (1992) L293.
7. W. Kern and D. A. Putinen: RCA Rev. 31 (1970) 187.
8. H. Yamamoto and K. Koyama: Oyo Buturi 66 (1997) 662 [in Japanese].
9. N. Fujino, I. Karino, K. Kuramoto, J. Kobayashi, S. Wakiyama and M. Ohmori: Oyo Buturi 66 (1997) 732 [in Japanese].
10. M. Miyazaki, S. Miyazaki, Y. Yanase, T. Ochiai and T. Shigematsu: Jpn. J. Appl. Phys. 34 (1995) 6303.
11. N. Fujino, I. Karino, J. Kobayashi, K. Kuramoto, M. Ohomori, M. Yasutake and S. Wakiyama: J. Electrochem. Soc. 143 (1996) 4125.
12. C. F. Bohren and E. H. Huffman: Absorption and Scattering of Light by Small Particles (Wiley, New York, 1983).
13. D. V. Edward: Handbook of Constants of Solids (Academic Press, New York, 1985) p. 547.
14. M. Kato, T. Yoshida, Y. Ikeda and Y. Kitagawara: Jpn. J. Appl. Phys. 35 (1996) 5597.
15. M. Nishimura, S. Yoshino, H. Motomura, S. Shimura, T. Mchedlidze and T. Hikone: J. Electrochem. Soc. 143 (1996) L243.
16. T. Ueki, M. Itsumi and T. Takeda: Appl. Phys. Lett. 70 (1997) 1248.
17. Y. Kitagawara, K. Aihara, S. Oka and T. Takenaka: Proc. 24th Symp. ULSI Ultra Clean Technology (Ultra Clean Society, Tokyo,1995) p. 286.
18. H. Shimizu, Y. Sugino, N. Suzuki, S. Kiyota, K. Nagasawa, M. Fujita, K. Takeda and S. Isomae: Jpn. J. Appl. Phys. 36 (1997) 2565.