Influence of laser parameters on the formation of ablative plasma fluxes and the properties of deposited thin films

Applied Surface Science

Volumn 127-129, Issue , 1998, Pages 614-619

  Ozegowski, M ^a   Metev, S ^a   Sepold, G ^a  

^a BIAS BREMER INSTITUT FÜR ANGEWANDTE STRAHLTECHNIK GMBH   (Germany)

Author keywords

Al 2 O 3; Plasma; PLD; Synchronous superposition

Indexed keywords

CARBON DIOXIDE LASERS; DEPOSITION; EXCIMER LASERS; LASER ABLATION; MORPHOLOGY; NEODYMIUM LASERS; PLASMA APPLICATIONS; PLASMA DENSITY; PULSED LASER APPLICATIONS; THIN FILMS;

LASER PARAMETERS; PULSED LASER ABLATION;

ALUMINA;

EID: 19244369786     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(97)00714-9     Document Type: Article

References (5)

1. D. Chrisey, G. Hubler (Eds.), Pulsed Laser Deposition of Thin Films, Wiley, New York, 1994, and references therein.
2. S. Metev, M. Ozegowski, G. Sepold, S. Burmester, Appl. Surf. Sci. 96-98 (1996) 122.
3. M. Ozegowski, S. Metev, G. Sepold, S. Burmester, MRS Symp. Proc., 397, p. 81
4. H.T. Busher, R.G. Tomlinson, E.K. Damon, Phys. Rev. Lett. 15 (1965) 847.
5. V.P. Ageev, A.I. Barchukov, F.V. Bunkin, V.I. Konov, S.M. Metev, A.C. Silenok, N.I. Chapliev, Izvestija VUS, Fis. 11 (1977) 34 (in Russian).