Planar inductively coupled plasmas operated with low and high radio frequencies

IEEE Transactions on Plasma Science

Volumn 27, Issue 1, 1999, Pages 68-69

  Tuszewski, Michel ^a  

^a LOS ALAMOS NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ELECTRONS; PLASMA DENSITY; PLASMA SOURCES;

GAS DISCHARGES; INDUCTIVELY COUPLED PLASMA;

PLASMA ETCHING;

EID: 0032687197     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.763041     Document Type: Article

References (6)

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