Corrosion resistance studies on α-C3N4 thin films deposited on pure iron by plasma-enhanced chemical vapor deposition

Journal of Materials Science Letters

Volumn 18, Issue 9, 1999, Pages 685-687

  Zhang, Zhihong ^a   Guo, Huaixi ^a   Xu, Yi ^a   Zhang, Wei ^a   Fan, Xiangjun ^a  

^a WUHAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CORROSION RESISTANCE; ELECTROCHEMICAL ELECTRODES; NITRIDES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SUBSTRATES; SYNTHESIS (CHEMICAL); THIN FILMS; X RAY DIFFRACTION ANALYSIS;

CARBON NITRIDE THIN FILMS; SCANNING POTENTIAL VELOCITY;

PROTECTIVE COATINGS;

EID: 0032686191     PISSN: 02618028     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1006631925848     Document Type: Article

References (18)

1. A. Y. LIU and M. L. COHEN, Science 245 (1989) 841.
2. Idem., Phys. Rev. B 41 (1990) 10727.
3. D. M. TETER and R. J. HEMLEY, Science 271 (1996) 53.
4. A. Y. LIU and R. M. WENTZCOVITCH, Phys. Rev. B 50 (1994) 10362.
5. C. S. TORNG, J. M. SIVERTSEN, J. H. JUNDY and C. CHANG, J. Mater. Res. 5 (1990) 2490.
6. M. L. CHEN, D. LI, X. LIN, V. P. DRAVID, Y. W. CHUNG, M. S. WONG and W. D. SPROUL, J. Vac. Sci. Technol. A11 (1993) 521.
7. S. VEPERK, J. WEIDMANN and F. GLATZ, ibid. A13 (1995) 2914.
8. D. MARTON, K. J. BOYD, A. H. AL-BAYATI, S. S. TODOROV and J. W. RABALAIS, Phys. Rev. Lett. 73 (1994) 118.
9. S. KUMAR and T. L. TANSLEY, Solid State Comm. 88 (1993) 803.
10. K. M. YU, M. L. COHEN, E. E. HALLER, W. L. HANSER, A. Y. LIU and I. C. WU, Phys. Rev. B 49 (1994) 5034.
11. C. NIU, Y. Z. LU and C. M. LIEBER, Science 261 (1993) 334.
12. X. A. ZHAO, C. W. ONG, Y. C. TSANG, Y. W. WONG, P. W. CHAN and L. CHOY, Appl. Phys. Lett. 66 (1995) 2652.
13. K. OGATA, J. F. D. CHUBACI and F. FUJIMOTO, J. Appl. Phys. 76 (1994) 3791.
14. F. ROSSI, B. ANDRE, A. VAN VEEN, P. E. MIJNARENDS, H. SCHUT et al., J. Mater. Res. 9 (1994) 2440.
15. A. BOUSETTA, M. LU and A. BENSAOULA, J. Vac. Sci Technol. A13 (1995) 1639.
16. D. WU, D. FU, H. GUO et al., Phys. Rev. B 56 (1997) 4949.
17. Y. CHEN, LIPING GUO and E. G. WANG, J. Mater. Sci. Lett. 16 (1997) 594.
18. H. HAN and B. J. FELDMAN, Solid State Comm. 65 (1998) 921.