XPS study of polycrystalline and epitaxial FeTaN films deposited by d.c. reactive magnetron sputtering

Surface and Interface Analysis

Volumn 27, Issue 4, 1999, Pages 259-272

  Yang, Dehua ^a   Jiang, Hai ^a   Ott, Ronald ^a   Minor, Kevin ^a   Grant, Jonathan ^a   Varga, Lajos ^a   Barnard, John A ^a   Doyle, William D ^a  

^a University of Alabama   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BINDING ENERGY; CARBON; EPITAXIAL GROWTH; IRON COMPOUNDS; MAGNETRON SPUTTERING; NITRIDES; NITROGEN; POLYCRYSTALLINE MATERIALS; SPUTTER DEPOSITION; SYNTHESIS (CHEMICAL); X RAY PHOTOELECTRON SPECTROSCOPY;

IRON TANTALUM NITRIDE;

MAGNETIC THIN FILMS;

EID: 0032679518     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(199904)27:4<259::AID-SIA560>3.0.CO;2-N     Document Type: Article

References (36)

1. T. K. Kim and M. Takahashi, Appl. Phys. Lett. 20, 492 (1972).
2. S. Wang and M. H. Kryder, J. Appl. Phys. 67, 5134 (1990).
3. P. B. Narayan and Y. K. Kim, IEEE Trans. Magn. 30, 3921 (1994).
4. Kyusik Sin and Shan X. Wang, J. Appl. Phys. 79, 5901 (1996).
5. H. Nakajima, Y. Ohashi and K. Shiiki, J. Magn. Magn. Mater. 167, 259 (1997).
6. D. C. Sun, E. Y. Jiang and D. Sun, Thin Solid Films 298, 116 (1997).
7. M. Komuro, Y. Kozono, M. Hanazono and Y. Sugita, J. Appl. Phys. 67, 5126 (1990).
8. Y. Sugita, K. Mitsuoka, M. Komuro, H. Hoshiya, Y. Kozono and M. Hanazono, J. Appl. Phys. 70, 5977 (1991).
9. Y. Iitake and Y. Shimada, IEEE Trans. J. Magn. Jpn 7, 113 (1992).
10. M. Kadono, T. Yamamoto, M. Michijima, M. Kyoho, T. Matsuda and T. Muramatsu, IEEE Trans. Magn. 30, 3924 (1994).
11. D. L. Peng, T. J. Konno, K. Sumiyama, H. Onodera and K. Suzuki, J. Magn. Magn. Mater. 172, 41 (1997).
12. B. Viala, M. K. Minor and J. A. Barnard, IEEE Trans. Magn. 32, 3506 (1996).
13. B. Viala, M. K. Minor and J. A. Barnard, J. Appl. Phys. 80, 3941 (1996).
14. N. Ishiwata, C. Wakabayashi and H. Urai, J. Appl. Phys. 69, 5616 (1991).
15. J. Lin, L. Chen and C. Chen, IEEE Trans. Magn. 30, 3912 (1994).
16. B. Y. Wong, S. Suwabe, F. Tsuneda and D. E. Laughlin, IEEE Trans. Magn. 31, 3967 (1995).
17. G. Qiu, E. Haftek and J. A. Barnard, J. Appl. Phys. 73, 6573 (1993).
18. Y. Takeshima, N. Ishiwata, T. Korenari and H. Urai, J. Appl. Phys. 73, 6576 (1993).
19. L. Varga and W. D. Doyle, J. Appl. Phys. 79, 4996 (1996).
20. K. Nago, H. Sakakima and K. Ihara, IEEE Trans. J. Magn. Jpn. 7, 119 (1992).
21. G. Qiu, E. Haftek, J. C. Cates, C. Alexander, JR. and J. A. Barnard, Mater. Res. Soc. Symp. Proc. 313, 339 (1993).
22. E. Haftek and J. A. Barnard, IEEE Trans. Magn. 30, 3915 (1994).
23. G. Qiu and J. A. Barnard, J. Appl. Phys. 75, 6934 (1994).
24. W. C. Chang, D. C. Wu, J. C. Lin and C. J. Chen, J. Appl. Phys. 79, 5159 (1996).
25. L. Varga, W. D. Doyle, T. Klemmer, P. J. Flanders and K. J. Kozaczek, IEEE Trans. Magn. 32, 3542 (1996).
26. V. R. Inturi and J. A. Barnard, IEEE Trans. Magn. 31, 2660 (1995).
27. H. A. Wriedt, N. A. Gokcen and R. H. Nafziger, Bull. Alloy Phase Diagrams 8, 355 (1987).
28. K. Kusumi, H. Miyajima and Y. Otani, J. Magn. Soc. Jpn. 18, 241 (1994).
29. J. F. Moulder, W. F. Stickle, P. E. Sobol and K. D. Bomden, in Handbook of X-ray Photoelectron Spectroscopy, edited by J. Chastain and R. C. King, Jr., p. 26. Physical Electronics, Inc. Eden Prairie, MN (1995).
30. J. F. Watts, in An Introduction to Surface Analysis by Electron Spectroscopy, edited by Royal Microscopical Society, Chapt. 1, p. 8. Oxford University Press, Oxford (1990).
31. J. C. Lee, C. S. Chung, H. J. Kang, Y. P. Kim and D. W. Moon, J. Vac. Sci. Technol. A 13, 1325 (1995).
32. V. S. Sundaram, M. B. de Moraes, J. D. Rogers and G. G. Kleiman, J. Phys. F 11, 1151 (1981).
33. J. A. Rodriguez and D. W. Goodman, Science 257, 897 (1992).
34. J. A. Rodriguez, R. A. Campbell, D. W. Goodman, Surf. Sci. 307-309, 377 (1994).
35. D. R. Rainer, K. S. Corneille and D. W. Goodman, J. Vac. Sci. Technol. A 13, 1595 (1995).
36. G. Jun, S. Cho, K. Kim, H. Shin and D. Kim, Jpn. J. Appl. Phys. 37, L30 (1998).