Stress and magnetic properties in high moment FeN thin films

Journal of Applied Physics

Volumn 79, Issue 8 PART 2B, 1996, Pages 5901-5903

  Sin, Kyusik ^a   Wang, Shan X ^a  

^a Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0141441902     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.362166     Document Type: Article

References (9)

1. E. S. Murdock, R. F. Simons, and R. Davidson, IEEE Trans. Magn. MAG-28, 3079 (1992).
2. S. Wang and M. H. Kryder, J. Appl. Phys. 67, 5134 (1990).
3. P. A. Flinn, D. S. Gardner, and W. D. Nix, IEEE Trans. Electron Devices ED-34, 689 (1987).
4. M. H. Kryder, S. Wang, and K. Rook, J. Appl. Phys. 73, 6212 (1993).
5. N. Ishiwata, C. Wakabayashi, and T. Matsumoto, IEEE Trans. Magn. MAG-24, 3078 (1988).
6. M. A. Russak, C. V. Jahnes, E. Klokholm, J.-W. Lee, M. E. Re, and B. C. Webb, J. Appl. Phys. 70, 6427 (1990).
7. J. C. Gates, C. Alexander, Jr., E. Haftek, and J. A. Barnard, IEEE Trans. Magn. MAG-29, 3105 (1993).
8. K. H. Jack, J. Appl. Phys. 76, 6620 (1994).
9. C. Barrett and T. Massalski, Structure of Metals, 3rd rev. ed. (Pergamon, Oxford, 1980), p. 259.