Differentiation of field-induced and native oxide using selective formation of self-assembled monolayer

Applied Surface Science

Volumn 144-145, Issue , 1999, Pages 425-429

  Inoue, Atsuhisa ^a   Mizutani, Wataru ^b   Ishida, Takao ^a   Choi, Nami ^a   Tokumoto, Hiroshi ^b  

^a JT RES CENTER FOR ATOM TECHNOLOGY   (Japan)

^b NATL INST FOR ADV INTERDISC RES   (Japan)

Author keywords

FIO; OTS; SAM

Indexed keywords

ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; GROWTH (MATERIALS); MOISTURE; MOISTURE CONTROL; NITROGEN; OXIDATION; OXIDES; PARAFFINS; SILICON COMPOUNDS; SUBSTRATES;

ALKYLSILOXANE SELF ASSEMBLED MONOLAYER; AREA SELECTIVE OXIDATION; FIELD INDUCED OXIDATION; NATIVE OXIDE; OCTADECYLTRICHLOROSILANE SELF ASSEMBLED MONOLAYER; SELF ASSEMBLED MONOLAYER; SILICON OXIDE;

MONOLAYERS;

EID: 0032679076     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00835-6     Document Type: Article

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