Self-assembled-monolayer film islands as a self-patterned-mask for SiO2 thickness measurement with atomic force microscopy

Applied Physics Letters

Volumn 70, Issue 25, 1997, Pages 3398-3400

  Komeda, T ^a   Namba, K ^a   Nishioka, Y ^a  

^a Texas Instruments Japan Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0011370523     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.119183     Document Type: Article

References (25)

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