Porous silicon technique for realization of surface micromachined silicon structures with large gaps

Sensors and Actuators, A: Physical

Volumn 74, Issue 1, 1999, Pages 104-108

  Artmann, Hans ^a   Frey, Wilhelm ^a  

^a ROBERT BOSCH GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DAMPING; ELECTROLYTIC POLISHING; MICROMACHINING; PRESSURE; Q FACTOR MEASUREMENT; SILICON ON INSULATOR TECHNOLOGY; SUBSTRATES; SURFACE ROUGHNESS; SURFACES;

AIR DAMPING; LARGE GAPS; SACRIFICIAL LAYER TECHNIQUE; VIBRATING MICROSYSTEMS;

POROUS SILICON;

EID: 0032677310     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(98)00332-X     Document Type: Article

References (8)

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