Effect of applying an electric field during air annealing on the resistance of Ti films

Journal of Physics D: Applied Physics

Volumn 32, Issue 13, 1999, Pages 1503-1505

  Parkansky, N ^a   Alterkop, B ^a   Goldsmith, S ^a   Boxman, R L ^a  

^a TEL AVIV UNIVERSITY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELECTRIC RESISTANCE; ELECTRIC VARIABLES MEASUREMENT; METALLIC FILMS; OXYGEN; THICKNESS MEASUREMENT; TITANIUM; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

AIR ANNEALING; APPLIED VOLTAGE; OHMIC RESISTANCE;

ELECTRIC FIELD EFFECTS;

EID: 0032676342     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/32/13/310     Document Type: Article

References (11)

1. Minami T, Sonohara H, Kakumi T and Takata S 1995 Thin Solid Films 270 37
2. Adachi K, Hirayma T and Sakata H 1990 J. Mater. Sci. 25 143
3. Kaplan L, Rusman I, Boxman R L, Goldsmith S, Nathan M and Ben-Jacob E 1996 Thin Solid Films 290-1 355
4. Parkansky N, Boxman R L, Goldsmith S, Rosenberg Yu, Ben-Shalom A, Kaplan L and Arbily D 1994 Surf. Coat. Tech. 68/69 320
5. Parkansky N, Rosenbaum R, Rosenberg Y, Boxman R L and Goldsmith S 1995 Surf. Coat. Tech. 76/77 197
6. Parkansky N, Alterkop B, Schuster W, Boxman R L and Goldsmith S 1997 J. Appl. Phys. 82 4062
7. Parkansky N, Alterkop B, Rosenberg Yu, Boxman R L and Goldsmith S 1998 Thin Solid Films 333 150
8. Boxman R L and Goldsmith S 1992 Surf. Coat. Tech. 52 39
9. Parkansky N, Alterkop B, Goldsmith S, Boxman R L and Rosenberg Yu 1999 J. Appl. Phys. 85 498
10. Ohring M 1992 The Materials Science of Thin Films (San Diego: Academic) p 582
11. Ohmori A, Park K-C, Inuzuka M, Arata Y, Inoue K and Iwamoto N 1991 Thin Solid Films 201 1