Oxidation of cobalt pre-reacted SiGe epilayer grown on Si(100)

Surface Science

Volumn 429, Issue 1, 1999, Pages 274-278

  Prabhakaran, K ^a   Sumitomo, K ^a   Ogino, T ^a  

^a NTT Basic Research Laboratories   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; CHEMICAL BONDS; GERMANIUM; MOLECULAR BEAM EPITAXY; OXIDATION; OXYGEN; SILICA; SILICON; SILICON ALLOYS; SURFACES; ULTRAVIOLET SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

MEDIUM ENERGY ION SCATTERING; SILICON GERMANIUM; SOLID SOURCE MOLECULAR BEAM EPITAXY;

COBALT;

EID: 0032673797     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(99)00388-X     Document Type: Article

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