Low-dose SIMOX wafers for LSIs fabricated with internal-thermal-oxidation (ITOX) process: Electrical characterization

Journal of Materials Science: Materials in Electronics

Volumn 10, Issue 5, 1999, Pages 365-371

  Matsumura, A ^a   Kawamura, K ^a   Hamaguchi, I ^a   Takayama, S ^a   Yano, T ^a   Nagatake, Y ^a  

^a NIPPON STEEL CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE; LSI CIRCUITS; THERMOOXIDATION;

INTERNAL THERMAL OXIDATION (ITOX) PROCESS;

SILICON WAFERS;

EID: 0032666237     PISSN: 09574522     EISSN: None     Source Type: Journal    
DOI: 10.1023/a:1008997423606     Document Type: Article

References (16)

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