0.25μm CMOS/SIMOX gate array LSI

Digest of Technical Papers - IEEE International Solid-State Circuits Conference

Volumn 39, Issue , 1996, Pages 86-87

  Ino, Masayuki ^a   Sawada, Hirotoshi ^a   Nishimura, Kazuyoshi ^a   Urano, Masami ^a   Suto, Hiroki ^a   Date, Shigeru ^a   Ishihara, Takako ^a   Takeda, Tadao ^a   Kado, Yuichi ^a   Inokawa, Hiroshi ^a   Tsuchiya, Toshiaki ^a   Sakakibara, Yutaka ^a   Arita, Yoshinobu ^a   Izumi, Katsutoshi ^a   Takeya, Ken ^a   et al , ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC INVERTERS; ELECTRIC LOSSES; EXCIMER LASERS; GATES (TRANSISTOR); ION IMPLANTATION; LITHOGRAPHY; NAND CIRCUITS; SILICON ON INSULATOR TECHNOLOGY; ULTRATHIN FILMS;

GATE ARRAY; SIMOX;

LSI CIRCUITS;

EID: 0030081180     PISSN: 01936530     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)