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Volumn 74, Issue 1, 1999, Pages 24-26

Silicon elastomer as a protective layer in 3D microfabrication of micro-opto-electro-mechanical systems

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ELASTOMERS; ETCHING; MICROELECTROMECHANICAL DEVICES; THREE DIMENSIONAL;

EID: 0032664851     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(98)00329-X     Document Type: Article
Times cited : (2)

References (5)
  • 1
    • 0031268305 scopus 로고    scopus 로고
    • Micromachining for optical and optoelectronic systems
    • Wu M.C. Micromachining for optical and optoelectronic systems. Proc. of the IEEE. 85:1997;1833-1856.
    • (1997) Proc. of the IEEE , vol.85 , pp. 1833-1856
    • Wu, M.C.1
  • 4
    • 0031164183 scopus 로고    scopus 로고
    • Etch stop techniques for micromachining
    • Collins S.D. Etch stop techniques for micromachining. J. Electrochem. Soc. 144:1997;2242-2262.
    • (1997) J. Electrochem. Soc. , vol.144 , pp. 2242-2262
    • Collins, S.D.1
  • 5
    • 0029238587 scopus 로고
    • Electrochemical etch-stop characteristics of TMAH:IPA solutions
    • Acero M.C., Esteve J., Burrer C., Gotz A. Electrochemical etch-stop characteristics of TMAH:IPA solutions. Sensors and Actuators A. 46-47:1995;22-26.
    • (1995) Sensors and Actuators a , vol.4647 , pp. 22-26
    • Acero, M.C.1    Esteve, J.2    Burrer, C.3    Gotz, A.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.