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Volumn 61-62, Issue , 1999, Pages 151-154

Nitrogen impurity incorporation behavior in a chimney HTCVD process: Pressure and temperature dependence

Author keywords

C Si ratio; HTCVD; Nitrogen doping; Pressure; SiC; Temperature

Indexed keywords

HIGH TEMPERATURE CHEMICAL VAPOR DEPOSITION (HTCVD);

EID: 0032661860     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(98)00490-5     Document Type: Article
Times cited : (10)

References (10)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.