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Journal of Non-Crystalline Solids

Volumn 245, Issue , 1999, Pages 169-174

Electron paramagnetic resonance spectra of interface defects in nitric oxide treated Si/SiO2

(6) Von Bardeleben, H J a Cantin, J L a Gosset, L G a Ganem, J J a Trimaille, I a Rigo, S a

a SORBONNE UNIVERSITÉ (France)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; CRYSTAL ATOMIC STRUCTURE; CRYSTAL DEFECTS; NITRIDING; NITROGEN OXIDES; OXIDATION; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE STRUCTURES; SILICA; SILICON WAFERS;

NUCLEAR ANALYSIS;

SEMICONDUCTING FILMS;

EID: 0032657315 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/S0022-3093(98)00862-X Document Type: Article

Times cited : (6)

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