Control of silicon particle behavior using a low frequency electromagnetic field in silane plasma chemical vapor deposition

Thin Solid Films

Volumn 341, Issue 1, 1999, Pages 59-62

  Yang, Sung Chae ^a   Fujiyama, Hiroshi ^a  

^a NAGASAKI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC FIELD EFFECTS; FILM PREPARATION; GRAVITATIONAL EFFECTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SILANES; TRANSPORT PROPERTIES;

CROSSED MAGNETIC FIELD; MODULATED ELECTROMAGNETIC FIELD; SCANNING PLASMA METHOD; SILICON PARTICLE BEHAVIOR;

SILICON;

EID: 0032655766     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01521-1     Document Type: Article

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