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Volumn 20, Issue 5, 1999, Pages 245-247

Direct ion-implanted 0.12-μm GaAs MESFET with ft of 121 GHz and fmax of 160 GHz

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; ION IMPLANTATION; MILLIMETER WAVES; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTOR DOPING; TRANSCONDUCTANCE;

EID: 0032654957     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.761028     Document Type: Article
Times cited : (12)

References (8)
  • 1
    • 0345023352 scopus 로고
    • Does two dimensional electron gas effect contribute to high frequency and high speed device performance?
    • M. Feng, C. L. Law, V. Eu, and C. Ito, "Does two dimensional electron gas effect contribute to high frequency and high speed device performance?," Appl. Phys. Lett., vol. 59, no. 19, pp. 1233-1235, 1991.
    • (1991) Appl. Phys. Lett. , vol.59 , Issue.19 , pp. 1233-1235
    • Feng, M.1    Law, C.L.2    Eu, V.3    Ito, C.4
  • 2
    • 0027224689 scopus 로고
    • On the speed and noise performance of direct ion-implanted GaAs MESFET's
    • Jan.
    • M. Feng and J. Laskar, "On the speed and noise performance of direct ion-implanted GaAs MESFET's," IEEE Trans. Electron Devices, vol. 40, pp. 9-17, Jan. 1993.
    • (1993) IEEE Trans. Electron Devices , vol.40 , pp. 9-17
    • Feng, M.1    Laskar, J.2
  • 3
    • 0030172923 scopus 로고    scopus 로고
    • Temperature dependent study of the microwave performance of 0.25-μm gate GaAs MESFET's and GaAs pseudomorphic HEMT's
    • June
    • M. Feng, D. R. Scherrer, P. J. Apostolakis, and J. W. Kruse, "Temperature dependent study of the microwave performance of 0.25-μm gate GaAs MESFET's and GaAs pseudomorphic HEMT's," IEEE Trans. Electron Devices, vol 43, pp. 852-860, June 1996.
    • (1996) IEEE Trans. Electron Devices , vol.43 , pp. 852-860
    • Feng, M.1    Scherrer, D.R.2    Apostolakis, P.J.3    Kruse, J.W.4
  • 4
    • 0345454515 scopus 로고    scopus 로고
    • mm-Wave ion implanted low noise process transfer from the University of Illinois
    • D. Danzilio, "mm-Wave ion implanted low noise process transfer from the University of Illinois," in Proc. 1998 Conf. GaAs Manufact. Technol., pp. 111-114.
    • (1998) Proc. 1998 Conf. GaAs Manufact. Technol. , pp. 111-114
    • Danzilio, D.1
  • 5
    • 0027871532 scopus 로고
    • 0.1 μm GaAs MESFET's fabricated using ion-implantation and photo-lithography
    • Y. Yamane, K. Nishimura, K. Inous, and M. Tokumitsu, "0.1 μm GaAs MESFET's fabricated using ion-implantation and photo-lithography," in GaAs IC Symp., 1993, vol. 21, pp. 185-188.
    • (1993) GaAs IC Symp. , vol.21 , pp. 185-188
    • Yamane, Y.1    Nishimura, K.2    Inous, K.3    Tokumitsu, M.4
  • 8
    • 0031639841 scopus 로고    scopus 로고
    • Low cost coplanar 77 GHz single-balanced mixed using ion-implanted GaAs Schottky diodes
    • R. Shimon, D. Caruth, J. Middleton, H. Hsia, and M. Feng, "Low cost coplanar 77 GHz Single-balanced mixed using ion-implanted GaAs Schottky diodes," in 1998 IEEE MTT-S Int. Symp. Dig., pp. 1439-1442.
    • (1998) 1998 IEEE MTT-S Int. Symp. Dig. , pp. 1439-1442
    • Shimon, R.1    Caruth, D.2    Middleton, J.3    Hsia, H.4    Feng, M.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.