LiNbO3 phase gratings prepared by a single excimer pulse through a silica phase mask

Applied Physics Letters

Volumn 69, Issue 10, 1996, Pages 1352-1354

  Luo, G P ^a   Lu, Y L ^a   Lu, Y Q ^a   Quo, X L ^a   Xiong, S B ^a   Ge, C Z ^a   Zhu, Y Y ^a   Liu, Z G ^a   Ming, N B ^a,b   Wu, J W ^c   Ding, D S ^c   Lu, Z H ^c  

^a NANJING UNIVERSITY   (China)

^b CCAST WORLD LABORATORY   (China)

^c SOUTHEAST UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL STRUCTURE; ETCHING; EXCIMER LASERS; FABRICATION; LITHIUM COMPOUNDS; MASKS; MORPHOLOGY; OPTICAL MICROSCOPY; SILICA; X RAY CRYSTALLOGRAPHY;

LITHIUM NIOBATE; PHASE GRATINGS; TRANSMISSION SILICA PHASE MASK;

DIFFRACTION GRATINGS;

EID: 0030565354     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.117433     Document Type: Article

References (10)

1. H. Kogelnik and C. V. Shank, Appl. Phys. Lett. 18, 152 (1971).
2. M. Matsuhara and K. O. Hill, J. Opt. Soc. Am. 65, 804 (1975).
3. K. O. Hill, B. Malo, F. Bilodeau, and D. C. Johnson, Annu. Rev. Mater. Sci. 23, 125 (1993).
4. K. O. Hill, Y. Fujii, D. C. Johnson, and B. S. Kawasaki, Appl. Phys. Lett. 32, 647 (1978).
5. G. Meltz, W. W. Morey, and W. H. Glenn, Opt. Lett. 14, 823 (1989).
6. K. O. Hill, B. Malo, F. Bilodeau, D. C. Johnson, and J. Albert, Appl. Phys. Lett. 62, 1035 (1993).
7. D. Z. Anderson, V. Mizrahi, T. Erdogan, and A. E. White, Electron. Lett. 29, 566 (1993).
8. J. Sochtig, R. Gross, I. Baumann, W. Sohler, H. Schutz, and R. Widmer, Electron. Lett. 31, 551 (1995).
9. J. M. Liu, Z. G. Liu, S. N. Zhu, and Z. C. Wu, Mater. Lett. 20, 35 (1994).
10. H. Tamada, A. Yamada, and M. Saitoh, J. Appl. Phys. 70, 2536 (1991).