Computer modeling of graphite oxidation: Differences between monolayer and multilayer etching

Computers and Chemistry

Volumn 23, Issue 2, 1999, Pages 175-183

  Stevens, F ^a   Beebe Jr , T P ^a  

^a UNIVERSITY OF UTAH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ETCHING; MOLECULAR ORIENTATION; MOLECULAR STRUCTURE; MONOLAYERS; MULTILAYERS; OXIDATION;

ETCH PIT GROWTH; HIGHLY ORIENTED PYROLYTIC GRAPHITE;

GRAPHITE;

EID: 0032650514     PISSN: 00978485     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0097-8485(98)00031-X     Document Type: Article

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