Mutually reactive elements in a glass host matrix: Ag and S ion implantation in silica

Journal of Materials Research

Volumn 14, Issue 6, 1999, Pages 2449-2457

  Bertoncello, R ^a   Gross, S ^a   Trivillin, F ^a   Cattaruzza, E ^a   Mattei, G ^a   Caccavale, F ^a   Mazzoldi, P ^a   Battaglin, G ^b   Daolio, S ^c  

^a UNIVERSITY OF PADOVA   (Italy)

^b INFM   (Italy)

^c Ist Polarografia ed E   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; CHEMICAL MODIFICATION; ION IMPLANTATION; REACTION KINETICS; SILVER; SILVER COMPOUNDS; SULFUR; TEMPERATURE;

DOUBLE ION IMPLANTATION; IMPLANTATION ENERGIES; METALLIC CLUSTERS; REACTIVE ELEMENTS; SILVER OXIDES; SILVER SILICATE;

FUSED SILICA;

EID: 0032648759     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1999.0329     Document Type: Article

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