Characterisation of the catalyst-semiconductor interaction mechanism in metal-oxide gas sensors

Sensors and Actuators, B: Chemical

Volumn 44, Issue 1-3, 1997, Pages 458-461

  Vlachos, D S ^a   Papadopoulos, C A ^a   Avaritsiotis, John N ^a  

^a NATIONAL TECHNICAL UNIVERSITY OF ATHENS   (Greece)

Author keywords

Fermi energy control; Metal oxide gas sensors; Spillover

Indexed keywords

CATALYSTS; COMPUTER SIMULATION; CRYSTAL MICROSTRUCTURE; FERMI LEVEL; INTERFACES (MATERIALS); INTERFACIAL ENERGY; MONTE CARLO METHODS; MOS DEVICES; PALLADIUM; PLATINUM; POLYCRYSTALLINE MATERIALS;

CATALYST SEMICONDUCTOR INTERACTION; METAL OXIDE GAS SENSORS; SPILLOVER PROCESS;

CHEMICAL SENSORS;

EID: 0031247170     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(97)00150-0     Document Type: Article

References (6)

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