Stability and uniformity of planar high temperature josephson junctions fabricated using nanolithography and ion damage

IEEE Transactions on Applied Superconductivity

Volumn 9, Issue 2 PART 3, 1999, Pages 3005-3007

  Katz, A S ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); ELECTRON BEAM LITHOGRAPHY; FABRICATION; ION IMPLANTATION; SUPERCONDUCTING FILMS; SUPERCONDUCTING TRANSITION TEMPERATURE; YTTRIUM BARIUM COPPER OXIDES;

HIGH TEMPERATURE JOSEPHSON JUNCTIONS; ION DAMAGE;

JOSEPHSON JUNCTION DEVICES;

EID: 0032638197     PISSN: 10518223     EISSN: None     Source Type: Journal    
DOI: 10.1109/77.783661     Document Type: Article

References (18)

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