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Volumn 38, Issue 2 B, 1999, Pages 1156-1157

Residual strain in semi-insulating InP wafers treated by multiple-step wafer annealing

Author keywords

InP; Multiple step wafer annealing; Photoelastic characterization; Residual strain; SIRP

Indexed keywords

ANNEALING; LIGHT POLARIZATION; PHOTOELASTICITY; POLARISCOPES; SEMICONDUCTING INDIUM PHOSPHIDE; STRAIN MEASUREMENT; TENSORS;

EID: 0032633507     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.1156     Document Type: Article
Times cited : (5)

References (14)
  • 13


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.