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Volumn 38, Issue 2 B, 1999, Pages 1156-1157
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Residual strain in semi-insulating InP wafers treated by multiple-step wafer annealing
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Author keywords
InP; Multiple step wafer annealing; Photoelastic characterization; Residual strain; SIRP
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Indexed keywords
ANNEALING;
LIGHT POLARIZATION;
PHOTOELASTICITY;
POLARISCOPES;
SEMICONDUCTING INDIUM PHOSPHIDE;
STRAIN MEASUREMENT;
TENSORS;
MULTI STEP WAFER ANNEALING;
PHOTOELASTIC CHARACTERIZATION;
PHOTOELASTIC STRAIN MEASUREMENT;
RESIDUAL STRAIN;
SCANNING INFRARED POLARISCOPE;
SEMI INSULATING WAFERS;
SEMICONDUCTING FILMS;
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EID: 0032633507
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.38.1156 Document Type: Article |
Times cited : (5)
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References (14)
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