The effects of KrF pulsed laser and thermal annealing on the crystallinity and surface morphology of radiofrequency magnetron sputtered ZnS:Mn thin films deposited on Si

Journal of Applied Physics

Volumn 86, Issue 5, 1999, Pages 2562-2570

  Mastio, E A ^a   Craven, M R ^a   Cranton, W M ^a   Thomas, C B ^a   Robino, M ^b   Fogarassy, E ^c  

^a NOTTINGHAM TRENT UNIVERSITY   (United Kingdom)

^b UNIVERSITÉ DE STRASBOURG   (France)

^c Faculté de Médecine   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL STRUCTURE; ELECTROLUMINESCENCE; LASER ABLATION; MANGANESE; MORPHOLOGY; PHOSPHORS; PULSED LASER APPLICATIONS; SILICON WAFERS; SURFACE ROUGHNESS; THIN FILMS; ZINC SULFIDE;

PULSED LASER ANNEALING;

OPTICAL FILMS;

EID: 0032620393     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371093     Document Type: Article

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