White beam pin-hole patterns of implanted layers

Journal of Alloys and Compounds

Volumn 286, Issue 1-2, 1999, Pages 349-353

  Wieteska, K ^a   Wierzchowski, W ^b   Graeff, W ^c  

^a INSTITUTE OF ATOMIC ENERGY   (Poland)

^b Department of Micro and Nanotechnology of Wide Bandgap Semiconductors   (Poland)

^c DESY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL LATTICES; DISLOCATIONS (CRYSTALS); ION IMPLANTATION; SEMICONDUCTING SILICON;

INTERFERENCE FRINGES; SYNCHROTRON LAUE METHOD; WHITE BEAM PIN-HOLE PATTERNS;

SEMICONDUCTING FILMS;

EID: 0032614746     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-8388(98)01038-X     Document Type: Article

References (4)

1. K. Wieteska, W. Wierzchowski, W. Graeff, J. Appl. Crystallogr. 30 (1997) 238.
2. K. Wieteska, W. Wierzchowski, W. Graeff, Il Nuovo Cimento 19 (2/4) (1997) 233.
3. W. Wierzchowski, K. Wieteska, W. Graeff, A. Turos, in: Highlights in X-Ray Synchrotron Radiation Research, 17-20 November, Grenoble, France, 1997, p. 104, Abstract Booklet.
4. K. Wieteska, W. Wierzchowski, W. Graeff, K. Dłużewska, Phys. Status. Solidi. (a) 168 (1998) 11.